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We perform thin film synthesis of a wide range of materials

Available coatings

We can deposit thin films and multilayers from sub-nm thicknesses up to several micrometers on up to four inch wafers (or objects of comparable size). Available materials include:

  • Pure metals, such as Al, Ti, or Pt
  • Amorphous metal alloys, such as AlZr or CoZr
  • Complex alloys or compounds, such as Ti2AlC or Cr2GeC
  • Metal nitrides, such as TiN or ZrN
  • Oxides, such as TiO2 or SiO2

To apply the coatings we have a range of deposition techniques at our disposal such as dc, rf and pulsed-dc magnetron sputtering, cathodic arc deposition and electron-beam evaporation.